The ‘SOFT RESIST’ (chemically active part of PR) should be easily removable from the wafer surface. 23.Photoresist Parameters (contd. LITHOGRAPHY Presentation Transcript. 28.What is PEB ? Interference lithography. This process of Hard PR removal is called STRIPPING Chemical used for stripping the hard PR is called ‘STRIPPER’ ‘Plasma Aching’ is the technique used for removing hard PR by plasma technique, 11.Types of PR Photoresists are of 2 types Positive – it creates a + ve image of the pattern on the mask Negative – it creates a – ve image of the pattern on the mask. You can change your ad preferences anytime. The Adobe Flash plugin is needed to view this content. v Negative resist - Exposed materials harden. 35.Thin layers of chromium can block UV light Thick layer of gold is required to block X – rays. Mankey ; gmankey_at_mint.ua.edu; 2 Lithography. Milling, grinding, casting, and even lithography shift atoms in great proportions; by contrast, the top-down approach involves utilizing tools to “carve” or cut out increasingly smaller components from a larger whole. Therefore a clear field mask is preferred. PPT ON CHARGED DEFECTS GETTERING AND CRYSTAL GROWI... PPT ON PACKET LOSS CONCEALMENT USING AUDIO MORPHING, PPT ON TRANSMISSION SYSTEM AND ITS CONFIGURATION. 16.Photoresist Parameters Dose – it is the total quantity per unit area of photons falling on PR. E-beam lithography stencil planning and optimization with. 6.What is Photoresist? In general, the various processes used to make an IC fall into three categories: film deposition, patterning, and semiconductor doping. If you continue browsing the site, you agree to the use of cookies on this website. Slideshare uses cookies to improve functionality and performance, and to provide you with relevant advertising. Lithography Lithography in the MEMS context is typically the transfer of a pattern to a photosensitive material by selective exposure to a radiation source such as light. Looks like you’ve clipped this slide to already. 18.Dark Field Mask and Clear Field Mask Active Region - region of interest Field Region – rest of the glass plate region If the field region is dark it is a dark field mask If the field region is clear , it is a clear field mask. The process uses light to make the conductive paths of a PCB layer and the paths and electronic components in the silicon wafer of microprocessors. – A free PowerPoint PPT presentation (displayed as a Flash slide show) on PowerShow.com - id: 44fffc-NWJjN = 1 / [log10(D100/D0)] Where D100 = lowest energy density for which all the resist is removed, D0 = lowest energy density needed to begin photo chemistry . For every node, the minimum feature sizes and their separations are reduced by a factor of √2. The photosensitive compound used in microelectronics is called Photoresist. Manufacturing techniques that are used today are highly unsophisticated at the molecular level. = Photon intensity x Exposure time Units: Energy (calories or joules) per unit area Sensitivity – amount of light energy necessary to create the chemical change Resolution – Smallest feature size that can be reproduced in a photoresist. Types of Nanolithography. The Hard PR should be easily removable when it is no longer required, without adversely affecting the other layers present. Remove this presentation Flag as Inappropriate I Don't Like This I like this Remember as a Favorite. 19.Preference between Dark Field Mask and Clear Field Mask For aligning mask with the pattern on the wafer we must see the wafer pattern through the mask. 31.Can we continue to reduce wave length to improve resolution? 34.X-ray Lithography Wavelength < 5 nm; Higher resolution No materials that can reflect or refract x-rays Must be accomplished by the direct printing process – similar to proximity printing. lithography can be related to e-beam lithography technology and stepper lithography technology. After the exposure process, the exposed part’s cross-links break down and become “softened” due to the photochemical reaction called photosolubilization, and will be dissolved by the developer, while the unexposed parts remain on the wafer surface. Types of Lithography. ... Types of lithography. Optical Lithography. It should have fine line definition that should be retained during subsequent processing while it is still present on the wafer. Introduction
The process through which we make microfluidic chips is called lithography. It was invented in 1798 by German Alois Senefelder (1771-1834), as a way of printing text, in particular his own plays. This presentation is an introduction to how we do lithography in the Zarelab.
There are actually two types of lithography involved in making a microfluidic chip: